ASML to Deliver First High-NA EUV Tool This Year
In a promising sign for the development of the next generation of EUV lithography machines, ASML has revealed that the company is set to deliver the industry’s first High-NA extreme ultraviolet (EUV) lithography scanner by the end of the year. That machine, the 0.55 numerical aperture (NA) Twinscan EXE:5000 pilot scanner, is being developed for…
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